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Digital Design and Signoff

Cadence® digital design and signoff solutions provide a fast path to design closure and better predictability, helping you meet your power, performance, and area (PPA) targets.

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Custom IC / Analog / RF Design

Cadence® custom, analog, and RF design solutions can help you save time by automating many routine tasks, from block-level and mixed-signal simulation to routing and library characterization.

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System Design and Verification

Cadence® system design and verification solutions, integrated under our Verification Suite, provide the simulation, acceleration, emulation, and management capabilities.

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IP

An open IP platform for you to customize your app-driven SoC design.

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  • Solve the challenges of long-reach signaling with Cadence 112G SerDes IP Watch Now
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IC Package Design and Analysis

Driving efficiency and accuracy in advanced packaging, system planning, and multi-fabric interoperability, Cadence® package implementation products deliver the automation and accuracy.

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  • Cadence Design Solutions certified for TSMC SoIC advanced 3D chip stacking technology Learn More
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System Analysis

Cadence® system analysis solutions provide highly accurate electromagnetic extraction and simulation analysis to ensure your system works under wide-ranging operating conditions.

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Embedded Software

PCB Design and Analysis

Cadence® PCB design solutions enable shorter, more predictable design cycles with greater integration of component design and system-level simulation for a constraint-driven flow.

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AI / Machine Learning

AI IP Portfolio

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  • PRODUCTS
    • DESIGN EXCELLENCE
      • Digital Design and Signoff
        • Logic Equivalence Checking
        • Innovus Implementation and Floorplanning
        • Functional ECO
        • Low-Power Validation
        • Synthesis
        • Power Analysis
        • Constraints and CDC Signoff
        • Silicon Signoff and Verification
        • Library Characterization
        • Test
        • Flows
      • Custom IC / Analog / RF Design
        • Circuit Design
        • Circuit Simulation
        • Layout Design
        • Layout Verification
        • Library Characterization
        • RF / Microwave Solutions
        • Flows
      • System Design and Verification
        • Debug Analysis
        • Emulation
        • Formal and Static Verification
        • FPGA-Based Prototyping
        • Planning and Management
        • Simulation
        • Software-Driven Verification
        • Verification IP
        • System-Level Verification IP
        • Flows
      • IP
        • Interface IP
        • Denali Memory IP
        • Tensilica Processor IP
        • Analog IP
        • System / Peripherals IP
        • Verification IP
      • IC Package Design and Analysis
        • Cross-Platform Co-Design and Analysis
        • IC Package Design
        • SI/PI Analysis
        • SI/PI Analysis Point Tools
        • Flows
    • SYSTEM INNOVATION
      • System Analysis
        • Electromagnetic Solutions
        • RF / Microwave Design
        • Thermal Solutions
        • System Analysis Resources Hub
      • Embedded Software
      • PCB Design and Analysis
        • Design Authoring
        • PCB Layout
        • Library and Design Data Management
        • Analog/Mixed-Signal Simulation
        • SI/PI Analysis
        • SI/PI Analysis Point Tools
        • What's New in Allegro
        • What's New in Sigrity
        • RF / Microwave Design
        • Flows
        • Advanced PCB Design & Analysis Blog
        • Augmented Reality Lab Tools
    • PERVASIVE INTELLIGENCE
      • AI / Machine Learning
      • AI IP Portfolio
    • CADENCE CLOUD
  • SOLUTIONS
      • INDUSTRIES
        • 5G Systems and Subsystems
        • Aerospace and Defense
        • Automotive
        • AI / Machine Learning
      • TECHNOLOGIES
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        • Advanced Node
        • Arm-Based Solutions
        • Cloud Solutions
        • Low Power
        • Mixed Signal
        • Photonics
        • RF / Microwave
      • INDUSTRIES
        • 5G Systems and Subsystems
        • Aerospace and Defense
        • Automotive
        • AI / Machine Learning
      • TECHNOLOGIES
        • 3D-IC Design
        • Advanced Node
        • Arm-Based Solutions
        • Cloud Solutions
        • Low Power
        • Mixed Signal
        • Photonics
        • RF / Microwave
      • INDUSTRIES
        • 5G Systems and Subsystems
        • Aerospace and Defense
        • Automotive
        • AI / Machine Learning
      • TECHNOLOGIES
        • 3D-IC Design
        • Advanced Node
        • Arm-Based Solutions
        • Cloud Solutions
        • Low Power
        • Mixed Signal
        • Photonics
        • RF / Microwave
      • INDUSTRIES
        • 5G Systems and Subsystems
        • Aerospace and Defense
        • Automotive
        • AI / Machine Learning
      • TECHNOLOGIES
        • 3D-IC Design
        • Advanced Node
        • Arm-Based Solutions
        • Cloud Solutions
        • Low Power
        • Mixed Signal
        • Photonics
        • RF / Microwave
  • SUPPORT
      • SUPPORT
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        • Tensilica Processor IP
      • SUPPORT
        • Support Process
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      • TRAINING
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      • SUPPORT
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Process Proximity Compensation

Production proven, third-generation computational lithography solution suite

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Key Benefits

  • Complete and comprehensive third-generation mask pattern synthesis solution built from the ground up for correct-by-construction OPC
  • Unmatched mask cycle time and the lowest cost of ownership
  • Accurate, yet easy to use

Meet the stringent accuracy, short turnaround time, and flexible ease-of-use requirements for all process technologies with Cadence® Process Proximity Compensation (PPC). This is a third-generation computational lithography solution suite and is production-proven from large nodes to most advanced processes to deliver the best post-etch CD accuracy and process window on silicon for every layer.

With the increasing gap between the capabilities of available lithography equipment and the requirements of aggressive device scaling, traditional optical proximity correction (OPC) / resolution enhancement technology (RET) methodologies are not able to keep up with the stringent computational lithography demands. You’ll likely need to work to enhance accuracy and ease-of-use and to accelerate mask cycle time. Coupled with the increasing cost of R&D investment and limited human resources, OPC teams are challenged to deliver better OPC model accuracy and maintain the same mask cycle time for an advanced technology node as they did for the previous technology node.

That’s where PPC comes in, delivering a complete and comprehensive third-generation mask pattern synthesis solution built from the ground up for correct-by-construction OPC with the fastest mask cycle time.

ASK US A QUESTION

Features:

  • Production-proven and most accurate industry-leading litho, etches, and mask models
  • Physics-based predictive process model (PPM) provides rigorous inversion of the patterning process and patented optimization techniques for correct-by-construction OPC
  • Multiple-area source optimization and source mask optimization combined with the hybrid SRAF placement solution maximize overall process window for given DOF
  • GUI or script-based input provide flexibility for recipe creation/optimization
  • Pipelined distributed processing of all mask pattern synthesis and verification steps on general-purpose hardware delivers unmatched mask turnaround time and the lowest cost of ownership

Contact Us

TRAINING COURSES

  • Related Products

    • CMP Predictor
    • LDE Electrical Analyzer
    • Litho Physical Analyzer
    • Cadence Pattern Analysis
News ReleasesVIEW ALL
  • Rockley Photonics Collaborates with Cadence to Create a High-Performance System for Hyperscale Data Centers 12/02/2020

  • Cadence Wins Four 2020 TSMC OIP Partner of the Year Awards 11/02/2020

  • Cadence Pegasus Verification System Certified for TSMC N16, N12 and N7 Process Technologies 10/08/2020

  • GLOBALFOUNDRIES Collaborates with Cadence on Availability of Mixed-Signal OpenAccess PDK for 22FDX Platform to Enable Advanced Mixed-Signal and mmWave Design 09/24/2020

  • Cadence Digital and Custom Flows Achieve Certification for TSMC N3 Process 08/25/2020

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Get the most out of your investment in Cadence technologies through a wide range of training offerings. We offer instructor-led classes at our training centers or at your site. We also offer self-paced online courses. Overview

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