Custom/Analog Advanced Node

Innovative capabilities for custom/analog designs at 20nm and below

Key Benefits

Increases quality of silicon: Re-engineered from the ground up to support the most aggressive advanced-node processes
Boosts productivity: New design methodologies along with the introduction of targeted automation techniques greatly enhance productivity of both circuit designers and layout engineers. Leveraging these flows and technologies can increase your productivity by up to 5X versus traditional design tools and flows.
Accurately predicts and manages variability: Close collaboration with leading foundries provides capabilities within the Virtuoso® advanced-node platform that enable you to predict and manage variability up front in the design flow and avoid costly design respins due to process variability
Industry leader in advanced-node custom design: The Virtuoso advanced-node platform supports and is certified by all major advanced 20/16/14/10/7nm technologies

Innovative capabilities for custom/analog designs at 20nm and below

It's well documented that designing at advanced-process nodes is extremely complicated and painfully expensive. With this in mind, system-on-chip (SoC) solutions must have the right mix of features, functionality, and performance to justify designing at these nodes. But of most concern to custom/analog designers are the challenges that arise from the complexity of manufacturing. The Cadence^® Virtuoso advanced-node platform has an innovative set of capabilities that enables designers to take full advantage of the silicon at these process nodes.

Density gradient effect avoidance

Designing at 20nm, 16nm, 10nm, 7nm Advanced Process Nodes

What makes designing at 20nm/16nm/14nm/10nm/7nm advanced nodes unique is the deep, complex interdependency of manufacturing and variability, on top of increasing power and performance specifications.

Concerns include:

Multiple-patterning technology (MPT) and color-aware physical design, including double, triple, quadruple, and penta-patterning
Layout-dependent effects (LDE) and density-gradient effects (DGE), in which the layout context—what is placed near to a device—can impact device performance by as much as 30%
Sophisticated color-aware custom routing
Exponentially increasing physical design rules
Device variation and sensitivity
New transistors types (e.g., FinFETs)

EM violation avoidance

Virtuoso Advanced-Node Platform

The Virtuoso advanced-node platform improves individual point tools to handle these challenges, as well as enables new design methodologies that allow for rapid layout prototyping, in-design signoff, and close collaboration between schematic and layout designers—essential to designing efficiently at advanced-process nodes.

The latest release of the Virtuoso advanced-node platform includes:

Robust support for FinFET-based designs, requiring MPT to manage device variability and sensitivity on the circuit design
Many enhanced interactive and automated capabilities to support a structured layout methodology with features such as core editing commands, interactive wire editor, module generators (ModGens), fully automated custom routing, and assisted placement, all design rules checking (DRC) and coloring correct
Unique and close integration with the Virtuoso physical verification system (PVS), enabling signoff verification support for both DRC and coloring decomposition within the Virtuoso Layout Suite