Overcoming Patterning-Induced Place-and-Route Challenges at 10nm

Discussion with Lars Liebmann (IBM), Vassilios Gerousis (Cadence), Paul Gutwin(Cadence), Mike Zhang(Cadence), Geng Han(IBM, Brian Cline (ARM) on Overcoming patterning induced place and route challenges at 10nm

上次修改時間: August 22, 2015

持續時間: 30 min