Digital 20nm RTL-to-GDSII Methodology

Hear a discussion on 20 nm digital opportunities and its challenges, Process and design methodology, 20nm proof points, Samsung-Cadence collaboration, Advantages of migrating to more advance process node, Why Double patterning, Ecountering 20nm RTL to GDSII methodology

上次修改时间: August 22, 2015

持续时间: 45 min