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Overcoming Patterning-Induced Place-and-Route Challenges at 10nm
Discussion with Lars Liebmann (IBM), Vassilios Gerousis (Cadence), Paul Gutwin(Cadence), Mike Zhang(Cadence), Geng Han(IBM, Brian Cline (ARM) on Overcoming patterning induced place and route challenges at 10nm
마지막 수정 날짜: August 22, 2015
지속 시간: 30 min