Overcoming Patterning-Induced Place-and-Route Challenges at 10nm

Discussion with Lars Liebmann (IBM), Vassilios Gerousis (Cadence), Paul Gutwin(Cadence), Mike Zhang(Cadence), Geng Han(IBM, Brian Cline (ARM) on Overcoming patterning induced place and route challenges at 10nm

Last Modified: March 11, 2019

Duration: 30 min