Home > Products > Digital Implementation > Encounter Digital Implementation System

Share

  • Email
  • Social Web
* Required Fields

Recipients email * (separate multiple addresses with commas)

Your name *

Your email *

Message *

Contact Us

* Required Fields
First Name *

Last Name *

Email *

Company / Institution *

Comments: *

Encounter Digital Implementation System 


Physical implementation for high-performance, giga-scale, low-power, and mixed-signal designs at advanced and mainstream process nodes


Encounter Digital Implementation System Datasheet »
Product Image Cadence® Encounter® Digital Implementation (EDI) System provides the most effective methodology to maximize power, performance, and area for high-performance, giga-scale designs. Integration with the Virtuoso® custom design environment ensures seamless data transfer and increases productivity for mixed-signal designs. EDI System also supports advanced 20nm process technologies and system-in-package/3D-IC design. With these capabilities, EDI System delivers the most comprehensive solution for physical implementation of today’s most demanding designs.

Benefits
Predictability and convergence
  • Combines full-chip implementation with in-design signoff analysis in a single environment
  • Enables design exploration and accurate chip feasibility analysis, including automated floorplan synthesis and ranking, as well as hierarchical budgeting and planning for convergent hierarchical implementation results
  • New GigaOpt and CCOpt engines deliver better power, performance, and area results for high-performance designs, allowing block implementation to meet and exceed aggressive goals
  • Achieves faster, more convergent timing closure by using same extraction engine during in-design and signoff
  • Supports comprehensive multi-mode/multi-corner analysis and optimization in all steps throughout the flow
  • Supports location-based on-chip-variation technologies and the latest methodologies for statistical timing and leakage analysis and optimization
Productivity and faster time to market
  • Supports hierarchical methodologies including bottom-up block-based flows, top-down black-box flows, and hybrid flows with partitioning and time budgeting
  • GigaFlex technology adapts to growing capacity requirements while still retaining the relevant timing, placement, and congestion information to accurately plan and implement giga-scale designs
  • FlexModels provide up to 90% netlist compression and an optimized interface for accurate design exploration and planning, resulting in faster turnaround time and one-pass implementation handoff
  • FlexILMs and FlexViews enable concurrent top- and block-level implementation and closure for hierarchical designs; more transparent hierarchical abstraction; and fewer iterations during top-level optimization and assembly
  • Supports a constraint-driven mixed-signal environment through the OpenAccess database, allowing for concurrent custom/digital design methodologies with smoother transitions between Virtuoso and Encounter environments
  • Performs fast and accurate optimization and analysis in the flat physical implementation flow by leveraging the new multi-CPU/multi-threaded–enabled Advanced Analysis Engine for single-step timing and signal integrity delay calculation
  • Delivers signoff-driven analysis during design implementation including multi-mode/multi-corner signoff ECO, as well as intuitive visual features for global timing, power, signal integrity, and clock tree diagnostics
Scalability in performance
  • Delivers industry-leading performance and capacity for large, complex chips
  • Offers a complete, end-to-end, multi-core parallel processing backplane and infrastructure
  • Provides best-in-class, efficient multi-corner functionality to significantly improve turnaround time
Differentiated product development with lower production costs
  • Includes comprehensive support for 28/20nm designs to handle design scale and complexity as well as new DFM requirements
  • Supports 20nm double-patterning physical implementation and signoff requirements, from placement and routing to timing, power, and physical signoff
  • Enables concurrent chip/package co-design and optimization with integrated capabilities such as automatic area and peripheral I/O placement and flip-chip RDL routing
  • Allows floorplanning, implementation, and analysis of 3D stacked-die designs with through-silicon-via (TSV) connectivity for optimization of heterogeneous processes/dies, ensuring fewer iterations and faster convergence with in-design 3D-IC signoff extraction and timing/power analysis across multiple dies