Design for manufacturing
Cadence Kits
Incisive functional verification
Encounter digital IC design
Virtuoso custom design
Allegro IC-PKG-PCB co-design
OrCAD PCB design
System-in-package design
Design for manufacturing
PRODUCTS
Assura DRC
Assura LVS
Cadence CMP Predictor
Cadence Litho Electrical Analyzer
Cadence Litho Physical Analyzer
Cadence QRC Extraction
Diva Physical Verification
Dracula
Encounter Test
Physical Verification System
DESIGN TASKS
Silicon analysis
Analysis and signoff
IP catalog
Print-friendly version
DESIGN FOR MANUFACTURING
White papersCosmicProduct descriptionsCommunity
Cadence design for manufacturing (DFM) technologies enable you to verify and optimize layouts in digital and custom IC designs, while providing a reliable way to achieve manufacturing sign-off before tape-out.
To successfully get nanometer-scale designs to market, semiconductor companies must address a growing array of challenges—from ever-more stringent design rules to increasing chip layout complexity. Designers must also contend with the physical effects that become much more troublesome at these smaller geometries. Lithographical and CMP manufacturing effects can have significant impact on both functional and parametric yield. Process variations across the die, wafer, and batch affect yield, performance, and reliability.

Cadence recognizes these challenges and has created the most comprehensive Design for Manufacturing (DFM) solutions in the industry. Cadence technologies are integrated into design flows to prevent manufacturing effects from impacting digital and custom layouts, analyze systematic and random variability on designs and optimize the design to maximize yield. In minimizing the impact of random and systematic manufacturing effects on functional and parametric yield, Cadence provides designers with the technologies and flows they need to address the industry's most difficult DFM challenges.

Cadence
What's new

Addressing manufacturing variation at advanced nodes
Applying silicon-coutour-based DFM is important as designers move into 45nm designs and beyond.

SPIE and the IC design world: a wall starts coming down
SPIE Advanced Lithography 2008 recently showed how much the wall between SoC design and chip manufacturing has come down.

Resource library
 

Product descriptions
Demos and webinars
Technical info
Success stories
News and events
User community

Support and services
 

Engineering services
SourceLink
Education
Downloads
User community

Request Information
Cadence