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An Update on the JEDEC Wide I/O Standard for 3D-ICs
One of the big advantages of 3D-ICs with through-silicon vias (TSVs) is the potential for much faster memory bandwidth compared to conventional 2D ICs. That's why the emerging JEDEC wide I/O mobile DRAM memory standard, which takes full advantage of 3D die stacking to provide significant power and...
Posted to
Industry Insights
(Weblog)
by
rgoering
on Thu, Dec 15 2011
Three Die Stack -- A Big Step “Up” for 3D-ICs with TSVs
A major advancement in 3D-IC through-silicon via (TSV) design will be unveiled Tuesday (Dec. 13) as representatives of CEA-LETI and ST-Ericsson describe the development of a three-die stack with wide I/O memory and logic. This tapeout is the result of a collaboration between these two organizations and...
Posted to
Industry Insights
(Weblog)
by
rgoering
on Tue, Dec 13 2011
Design for Test (DFT) – New Challenges at Advanced Process Nodes
Design for test (DFT) doesn't get a lot of press these days, which is unfortunate, because the demands of DFT are dramatically increasing as designers move to smaller lithography nodes. New fault types, test compression, and faster automatic test pattern generation (ATPG) are becoming critical. To...
Posted to
Industry Insights
(Weblog)
by
rgoering
on Thu, Sep 15 2011
GTC Panel: Getting Best Use From Older IC Process Nodes
Time for a mainstream revolution? That was the title of a lively panel discussion at the Global Technology Conference ( GTC ) Aug. 30. Panelists noted that there's still a lot of activity at 65nm and above. They discussed why this is true, whether mature nodes can be retrofitted with new capabilities...
Posted to
Industry Insights
(Weblog)
by
rgoering
on Mon, Sep 5 2011
Flash Memory Summit: New Insights Into the Future of NAND Flash
With deployment in some 5 billion mobile devices worldwide, flash memory has been wildly successful. But where will nonvolatile memory technology go from here, and how much further can it scale? Some answers emerged from three keynote speeches at the Flash Memory Summit August 9. The speakers were Yoram...
Posted to
Industry Insights
(Weblog)
by
rgoering
on Wed, Aug 10 2011
How Imec and Cadence “Wrapped Up” 3D-IC Test
One of the most challenging aspects of 3D-IC development involves the testing of vertical die stacks with through-silicon vias (TSVs). You have to propagate test data up and down through the stack, verify the functioning of TSVs that are too small to probe, and isolate the individual dies you want to...
Posted to
Industry Insights
(Weblog)
by
rgoering
on Mon, Aug 1 2011
Si2’s Steve Schulz: “Setting the Standards for EDA360”
EDA360 represents a significant change in which the EDA industry plays a broader role in the creation of hardware/software systems ready for applications deployment. A shift this profound must be rooted in industry standards, according to Steve Schulz, president of the Silicon Integration Initiative...
Posted to
Industry Insights
(Weblog)
by
rgoering
on Mon, Jun 27 2011
DAC Panel: 20nm is Tough, But Not a Roadblock
So far the move to lower semiconductor process nodes has continued unabated, but the upcoming 20nm node is causing a lot of concern. Lithography is so challenging that extra masks ( double patterning ) will be required. Will designs be technically and economically feasible? Panelists at the Design Automation...
Posted to
Industry Insights
(Weblog)
by
rgoering
on Mon, Jun 6 2011
Two New Resources for 3D-IC Design
Just in time for the Design Automation Conference (DAC), two new publications are providing fresh perspectives about 3D-IC design. First, the Global Semiconductor Alliance ( GSA ) has released a "3D-IC Design Tools and Services Tour Guide" for next week's DAC. Secondly, a new Cadence technical...
Posted to
Industry Insights
(Weblog)
by
rgoering
on Thu, Jun 2 2011
IEEE Workshop: Panelists Identify Requirements for 3D IC Adoption
3D ICs with through-silicon vias (TSVs) are in development by a few large companies, but they're a long ways from widespread adoption. What will it take to move this technology into the IC design mainstream? Panelists at the IEEE Electronic Design Processes ( EDP ) workshop April 8 came up with some...
Posted to
Industry Insights
(Weblog)
by
rgoering
on Thu, Apr 14 2011
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