Home > About Cadence > Newsroom > Cadence Articles > Cadence and GLOBALFOUNDRIES Speed Design for Manufacturing Signoff at 20nm and 14nm
Cadence and GLOBALFOUNDRIES have teamed up to provide pattern classification data resulting in 4X faster design for manufacturing (DFM) flows at 20n and 14nm. With a faster DFM flow, chip manufacturers can achieve better silicon yield and predictability.

Using the Cadence® Pattern Classification Solution, GLOBALFOUNDRIES can classify hundreds of thousands of yield detractor, process hotspots, and silicon failures into easily usable pattern libraries. This helps increase the efficiency of the GLOBALFOUNDRIES pattern matching-based lithography signoff flow called DRC+, which is being used in the most advanced processes.

GLOBALFOUNDRIES customers using Cadence design tools benefit from a silicon-proven DFM flow that’s easy to use and integrates seamlessly with Cadence custom, digital, and full-chip signoff flows.

“Cadence pattern classification technology helps GLOBALFOUNDRIES customers set and meet high expectations for yield, ensuring they get the highest possible return out of their complex designs. We appreciate GLOBALFOUNDRIES’ commitment to use our technology at 20nm and 14nm and the nodes to follow.”

Dr. Chi-Ping Hsu, Senior Vice President of R&D, Silicon Realization Group, Cadence

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