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Archived Webinar: Challenges and Solutions for 20nm-and-below Custom Design

Original webinar date:
13 Feb 2013  
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As custom designs move to the advanced process nodes of 20nm and below, one of the major challenges designers are grappling with is variation and its effects on the design. Variation manifests itself primarily in two ways: layout-dependent effects (affecting both the designer and the layout engineer), and variation that occurs because of new layout techniques that must be employed in a sub-20nm design. This webinar will introduce you to the ways that new Virtuoso technology is helping the industry overcome the challenges of custom design at complex nodes.

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