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lithography,variability

  • Customer, Partner DFM Concerns Spur New Methodologies

    Design for manufacturing (DFM) may not be as "hot" a topic as it was a few years ago - when there were many independent DFM companies - but foundries and chip design companies are in fact very concerned about DFM at 28nm and below. Some of those concerns have given rise to new technologies...
    Posted to Industry Insights (Weblog) by rgoering on Tue, Feb 7 2012
  • SPIE Papers Showcase DFM and Lithography R&D

    Ten Cadence papers planned for the upcoming SPIE Advanced Lithography conference, set for Feb. 12-16 in San Jose, California, demonstrate recent R&D developments in both "design side" design for manufacturing (DFM) and the computational lithography that takes place during the manufacturing...
    Posted to Industry Insights (Weblog) by rgoering on Thu, Jan 26 2012
  • Q&A: A Look at 20nm Design Challenges and Solutions

    The 20nm process node promises tremendous advantages in power, performance and design capacity, but also raises tough design challenges. These challenges include increased timing and power variability, complex layout rules, and incredibly large designs with massive amounts of IP. A major new challenge...
    Posted to Industry Insights (Weblog) by rgoering on Sun, Sep 11 2011
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