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leakage

  • SPIE Papers Showcase DFM and Lithography R&D
    Ten Cadence papers planned for the upcoming SPIE Advanced Lithography conference, set for Feb. 12-16 in San Jose, California, demonstrate recent R&D developments in both "design side" design for manufacturing (DFM) and the computational lithography that takes place during the manufacturing...
    Posted to Industry Insights (Weblog) by rgoering on Thu, Jan 26 2012

  • Q&A: Samsung’s Ana Hunter Offers Advance Look at 20nm
    While all process node migrations have posed challenges, the move to 20nm may be more challenging than most. At this process node, lithography is so difficult that extra masks ( double patterning ) will be widely deployed. But despite the costs and challenges, the promise of higher performance and lower...
    Posted to Industry Insights (Weblog) by rgoering on Mon, Jul 11 2011

  • Leakage Power and National Security
    I read an interesting article recently on EDN regarding a new way to determine cryptographic keys using leakage power. Differential power has long been documented to be a method of cracking keys. In this paper, the author, Milena Jovanovic of the University of Montenegro demonstrated that leakage power...
    Posted to Digital Implementation (Weblog) by Rich Owen on Fri, Oct 9 2009
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