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layout,LDE

  • User View: A 20nm Custom IC Constraint-Driven Flow

    If the semiconductor industry is going to ramp up for 20nm design, a custom IC flow that can handle this process node is essential. This flow will require more automation than previous nodes. In a recorded audio presentation at the Cadence web site Francois Lemery, member of the Technology R&D group...
    Posted to Industry Insights (Weblog) by rgoering on Wed, Jul 25 2012
  • SPIE Papers Showcase DFM and Lithography R&D

    Ten Cadence papers planned for the upcoming SPIE Advanced Lithography conference, set for Feb. 12-16 in San Jose, California, demonstrate recent R&D developments in both "design side" design for manufacturing (DFM) and the computational lithography that takes place during the manufacturing...
    Posted to Industry Insights (Weblog) by rgoering on Thu, Jan 26 2012
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