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industry insights,lithography,Samsung,20nm

  • Common Platform Forum Keynotes: 14nm FinFETs and Beyond

    How far can we continue to scale semiconductors? 14nm FinFET technology is the next major move, but that's far from the end of the story, according to keynote speakers at the Common Platform Technology Forum in Santa Clara, California Feb. 5, 2013. The keynotes, still available for on-line viewing...
    Posted to Industry Insights (Weblog) by rgoering on Wed, Feb 6 2013
  • Customer, Partner DFM Concerns Spur New Methodologies

    Design for manufacturing (DFM) may not be as "hot" a topic as it was a few years ago - when there were many independent DFM companies - but foundries and chip design companies are in fact very concerned about DFM at 28nm and below. Some of those concerns have given rise to new technologies...
    Posted to Industry Insights (Weblog) by rgoering on Tue, Feb 7 2012
  • DAC Panel: 20nm is Tough, But Not a Roadblock

    So far the move to lower semiconductor process nodes has continued unabated, but the upcoming 20nm node is causing a lot of concern. Lithography is so challenging that extra masks ( double patterning ) will be required. Will designs be technically and economically feasible? Panelists at the Design Automation...
    Posted to Industry Insights (Weblog) by rgoering on Mon, Jun 6 2011
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