Home > Community > Tags > giga hertz/layout-dependent effects
 
Login with a Cadence account.
Not a member yet?
Create a permanent login account to make interactions with Cadence more conveniennt.

Register | Membership benefits
Get email delivery of the Cadence blog (individual posts).
 

Email

* Required Fields

Recipients email * (separate multiple addresses with commas)

Your name *

Your email *

Message *

Contact Us

* Required Fields
First Name *

Last Name *

Email *

Company / Institution *

Comments: *

giga hertz,layout-dependent effects

  • Whitepaper: 20nm is More Than Just Double Patterning

    Probably the most discussed challenge of the 20nm process node is double patterning, which uses extra masks in order to get lithography equipment to print correctly. That is, indeed, a major change that has impacts throughout the design flow. But as a newly published Cadence whitepaper points out, double...
    Posted to Industry Insights (Weblog) by rgoering on Mon, Jul 9 2012
Page 1 of 1 (1 items)