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encounter,lithography,Flex Models

  • Q&A: A Look at 20nm Design Challenges and Solutions

    The 20nm process node promises tremendous advantages in power, performance and design capacity, but also raises tough design challenges. These challenges include increased timing and power variability, complex layout rules, and incredibly large designs with massive amounts of IP. A major new challenge...
    Posted to Industry Insights (Weblog) by rgoering on Sun, Sep 11 2011
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