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encounter,LELE

  • Place and route on SOC encounter

    Hello, I am a newbie at place and route operation. Can anyone please tell me how do you make sure that all the blockes i your design are arranged in a certain way while doing place and route . I mean I have like around 300 odd blockes to be eranged and I want them to be ordered row wise and column wise...
    Posted to Digital Implementation (Forum) by amythpai on Sun, Mar 17 2013
  • Via Placement issue.

    Hi every one, I'm Lakshmi Prashanth, and i'm new to this encounter tool, I've got a problem., initially when i was moving the PG net over the Macros, tool was automatically placing the via's, But suddenly yesterday, some via's are deleted automatically, I don't know how, and If...
    Posted to Digital Implementation (Forum) by Leader on Tue, Feb 12 2013
  • ARM TechCon: Inside Story of a 14nm FinFET Tapeout

    The next frontier in semiconductor design is the 14nm process node, and it will come with a new type of transistor, the FinFET. 14nm FinFET technology moved closer to reality at the ARM TechCon conference Oct. 30, 2012, where a Cadence sponsored technical session announced a 14nm test chip tapeout using...
    Posted to Industry Insights (Weblog) by rgoering on Wed, Oct 31 2012
  • Cadence, Samsung Detail 20nm RTL-to-GDSII Methodology

    In a recently archived May 2 webinar , speakers from Cadence and Samsung described a 20nm digital design methodology that can manage challenges such as double patterning, variability, and complexity. The webinar discussed EDA tools, physical IP, and 20nm process technologies, and it highlighted a "proof...
    Posted to Industry Insights (Weblog) by rgoering on Mon, May 7 2012
  • CDNLive! – IBM Expert Quantifies Design Impact of Double Patterning

    Double patterning will be an essential lithographic technique for ICs at 20nm and below. The more we can understand it, and quantify its impacts on the design flow, the easier it will be to adopt. A good step towards that understanding was taken at CDNLive! Silicon Valley 2012 (the recent Cadence user...
    Posted to Industry Insights (Weblog) by rgoering on Sun, Apr 1 2012
  • Problems Importing OA Design from Virtuoso into Encounter

    Hello, While trying to perform place and route using Encounter I'm "encountering" errors importing my design from Virtuoso. When I try to import the design, I get the following: Reading tech data from OA Library 'NCL' ... FE units: 0.001 microns/dbu, OA units: 0.001 microns/dbu...
    Posted to Digital Implementation (Forum) by TruLogic on Mon, Jan 10 2011
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