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UPF,UVM

  • New Incisive Low-Power Verification for CPF and IEEE 1801 / UPF

    On May 7, 2013 Cadence announced a 30% productivity gain in the June 2013 Incisive Enterprise Simulator 13.1 release . Advanced debug visualization, faster turn-around time, and the extension of eight years of low-power verification innovation to IEEE 1801/UPF are the key capabilities in the release...
    Posted to Low Power (Weblog) by Adam Sherilog on Tue, May 7 2013
  • What’s Next in Low Power?

    Low power has become a major consideration in chip design in almost all applications. One major achievement of the industry over the past a few years is the alignment on the low power design methodology, which was considered as the biggest hurdle to automate advanced low power design techniques. No matter...
    Posted to Low Power (Weblog) by QiWang on Tue, Jan 24 2012
  • 2011 EDA Standards Update and 2012 Forecast

    As system complexity grows and semiconductor process nodes shrink, EDA industry standards are more important than ever. With today's time-to-market pressures, the last thing you'd want to do is waste time due to incompatible formats, tools or methodologies. Fortunately, 2011 was a productive...
    Posted to Industry Insights (Weblog) by rgoering on Wed, Dec 21 2011
  • EDA Standards Review and Forecast, Part 1 – Accellera and IEEE

    Given increasing design complexity and skyrocketing costs, EDA standards have never been more important. As noted in the EDA360 vision paper , a standards-based ecosystem is absolutely essential if we're going to design the hardware and software that's needed to support tomorrow's creative...
    Posted to Industry Insights (Weblog) by rgoering on Mon, Dec 20 2010
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