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STMicroelectronics,20nm

  • User View: A 20nm Custom IC Constraint-Driven Flow

    If the semiconductor industry is going to ramp up for 20nm design, a custom IC flow that can handle this process node is essential. This flow will require more automation than previous nodes. In a recorded audio presentation at the Cadence web site Francois Lemery, member of the Technology R&D group...
    Posted to Industry Insights (Weblog) by rgoering on Wed, Jul 25 2012
  • DAC Panel: 20nm is Tough, But Not a Roadblock

    So far the move to lower semiconductor process nodes has continued unabated, but the upcoming 20nm node is causing a lot of concern. Lithography is so challenging that extra masks ( double patterning ) will be required. Will designs be technically and economically feasible? Panelists at the Design Automation...
    Posted to Industry Insights (Weblog) by rgoering on Mon, Jun 6 2011
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