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LDE,20nm whitepaper

  • Whitepaper: 20nm is More Than Just Double Patterning

    Probably the most discussed challenge of the 20nm process node is double patterning, which uses extra masks in order to get lithography equipment to print correctly. That is, indeed, a major change that has impacts throughout the design flow. But as a newly published Cadence whitepaper points out, double...
    Posted to Industry Insights (Weblog) by rgoering on Mon, Jul 9 2012
  • Whitepaper Summary: How to Succeed at 20nm

    The upcoming 20nm process node promises tremendous advantages in power, performance and area - but it's also very challenging in terms of design complexity, lithography, and manufacturability. A newly published whitepaper from Cadence, summarized here, sets forth an approach that can mitigate the...
    Posted to Industry Insights (Weblog) by rgoering on Thu, Aug 25 2011
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