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Industry Insights,lithography,Design Automation Conference

  • DAC Panel: 20nm is Tough, But Not a Roadblock

    So far the move to lower semiconductor process nodes has continued unabated, but the upcoming 20nm node is causing a lot of concern. Lithography is so challenging that extra masks ( double patterning ) will be required. Will designs be technically and economically feasible? Panelists at the Design Automation...
    Posted to Industry Insights (Weblog) by rgoering on Mon, Jun 6 2011
  • Two New DAC Panels: 20nm Design and Mixed-Signal Verification

    Two Design Automation Conference panels that you probably haven't heard off address two of the hottest issues in electronic design today. One panel focuses on 20nm design challenges, and the other tackles the perennially tough topic of mixed-signal verification. Both are free and organized by Cadence...
    Posted to Industry Insights (Weblog) by rgoering on Tue, May 31 2011
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