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ETS,EPS,Encounter

  • Cadence, Samsung Detail 20nm RTL-to-GDSII Methodology

    In a recently archived May 2 webinar , speakers from Cadence and Samsung described a 20nm digital design methodology that can manage challenges such as double patterning, variability, and complexity. The webinar discussed EDA tools, physical IP, and 20nm process technologies, and it highlighted a "proof...
    Posted to Industry Insights (Weblog) by rgoering on Mon, May 7 2012
  • Do Foundation Flows also exist for EPS or ETS?

    First post so please bear with me. We have seen posts, etc. about the encounter foundation flow. I have tried this and it works fairly well. Nice flow. While poking around in the ETS installation directory tree I found what appears to be foundation flows for EPS and ETS. Has anyone tried these either...
    Posted to Digital Implementation (Forum) by pdgeek on Tue, Oct 19 2010
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