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Double Patterning,22nm

  • SPIE Papers Showcase DFM and Lithography R&D

    Ten Cadence papers planned for the upcoming SPIE Advanced Lithography conference, set for Feb. 12-16 in San Jose, California, demonstrate recent R&D developments in both "design side" design for manufacturing (DFM) and the computational lithography that takes place during the manufacturing...
    Posted to Industry Insights (Weblog) by rgoering on Thu, Jan 26 2012
  • ARM Techcon: IBM Speaker Outlines Path to 22nm and Beyond

    An IBM industry address at this week's ARM Technology Conference ( ARM Techcon ) included both inspiration and a warning. The inspiration came from optimistic descriptions of the technologies that will propel us to 22nm and below. The warning was that it takes at least 10 years to bring new silicon...
    Posted to Industry Insights (Weblog) by rgoering on Wed, Nov 10 2010
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