Home > Community > Tags > DFM/pattern matching
 
Login with a Cadence account.
Not a member yet?
Create a permanent login account to make interactions with Cadence more conveniennt.

Register | Membership benefits
Get email delivery of the Cadence blog (individual posts).
 

Email

* Required Fields

Recipients email * (separate multiple addresses with commas)

Your name *

Your email *

Message *

Contact Us

* Required Fields
First Name *

Last Name *

Email *

Company / Institution *

Comments: *

DFM,pattern matching

  • SPIE Papers Showcase DFM and Lithography R&D

    Ten Cadence papers planned for the upcoming SPIE Advanced Lithography conference, set for Feb. 12-16 in San Jose, California, demonstrate recent R&D developments in both "design side" design for manufacturing (DFM) and the computational lithography that takes place during the manufacturing...
    Posted to Industry Insights (Weblog) by rgoering on Thu, Jan 26 2012
  • GLOBALFOUNDRIES DRC+ Donation: New Era for DFM Standards?

    DRC+, a pattern-matching design for manufacturability (DFM) technique developed by GLOBALFOUNDRIES in collaboration with Cadence, is heading for standardization through the Silicon Integration Initiative (Si2). As announced Oct. 20 at the Si2 Conference , GLOBALFOUNDRIES has donated DRC+ data structures...
    Posted to Industry Insights (Weblog) by rgoering on Sun, Oct 23 2011
  • “In Design” DFM Signoff – the Inside Story

    As noted in a recent customer announcement with Fujitsu, Cadence offers "in design" design for manufacturability (DFM) signoff for digital, mixed-signal and custom IC design. The basic idea is simple - engineers run signoff DFM checks during the physical design process, instead of waiting until...
    Posted to Industry Insights (Weblog) by rgoering on Wed, Oct 5 2011
  • ISQED Keynote: DFM Heads in Two New Directions

    Design for manufacturability (DFM) is a fairly mature discipline that you don't hear much about these days. But a recent keynote speech outlined two interesting new developments. One new twist complements traditional model-based and rules-based approaches with pattern matching, while another brings...
    Posted to Industry Insights (Weblog) by rgoering on Tue, Mar 15 2011
  • How DRC Plus Makes DFM Easy at 28nm

    Design for manufacturability (DFM) requirements have been a barrier for many design teams who are thinking about moving to lower process nodes. But can DFM actually get easier as process nodes shrink? That possibility is offered by DRC Plus (DRC+), a new technology developed by GLOBALFOUNDRIES in collaboration...
    Posted to Industry Insights (Weblog) by rgoering on Mon, Oct 25 2010
Page 1 of 1 (5 items)