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 Monte Carlo Simulation: Global+Local vs Local and Process vs Mismatch 

Last post Wed, Oct 19 2011 1:48 AM by berndf. 2 replies.
Started by yayla 05 Oct 2011 08:57 AM. Topic has 2 replies and 3581 views
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  • Wed, Oct 5 2011 8:57 AM

    • yayla
    • Top 150 Contributor
    • Joined on Tue, Jun 28 2011
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    Monte Carlo Simulation: Global+Local vs Local and Process vs Mismatch Reply

    Hi,

    I am runnig some Monte Carlo simulations and there are some options for model libraries like Global+Local and Local. Also, after choosing model setup in ADE, in Monte Carlo simulation, you can choose Process only, Mismatch Only and Process and Mismatch. First, I want to learn what the diffrence is between model setup(Global+Local vs Local) and difference between Monte Carlo Options(Process&Mismatch vs Process vs Mismatch). I have searched a litlle bit  and I have talked with colleagues but I couldn't find so much useful info.

    If you help me or direct me to some useful references, I will appreciate.

     

    Thanks,

    yayla

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  • Mon, Oct 17 2011 9:47 PM

    • LeJonT
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    Re: Monte Carlo Simulation: Global+Local vs Local and Process vs Mismatch Reply
    Hi, Me too interested in knowing the same. Have you got any answers/references? Thanks, Leo
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  • Wed, Oct 19 2011 1:48 AM

    • berndf
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    Re: Monte Carlo Simulation: Global+Local vs Local and Process vs Mismatch Reply

    Local variation aka mismatch is dependent on the device area, for a MOS w/l, and layout techniques.

    Where global variation is related to your process corners often called process monte calro.

    A good  reference 'Understanding MOSFET Mismatch for Analog Design, C. McAndrew'.

    Bernd

    • Post Points: 5
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Started by yayla at 05 Oct 2011 08:57 AM. Topic has 2 replies.